Analysis,fabrication,and measurement of Y aperture element frequency selective surface

作     者：李小秋 周建民 高劲松 

作者机构：Changchun Institute of Optics Fine Mechanics and PhysicsChinese Academy of SciencesChangchun 130033 Graduate School of the Chinese Academy of SciencesBeijing 100039 East China Jiaotong University Nanchang 330013 Changchun Institute of Optics Fine Mechanics and PhysicsChinese Academy of SciencesChangchun 130033 

出 版 物：《Chinese Optics Letters》 (中国光学快报（英文版）)

年 卷 期：2007年第5卷第11期

页      面：660-661页

核心收录：

学科分类：0808[工学-电气工程] 070207[理学-光学] 0809[工学-电子科学与技术（可授工学、理学学位）] 07[理学] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0803[工学-光学工程] 0702[理学-物理学] 

基　　金：This work was supported by the CAS Innovation Program 

主　　题：Calculations Photolithography Vacuum deposition 

摘      要：The analysis of Y aperture element frequency selective surface （FSS） using the spectral domain method and the moment method is presented. With the vacuum depositing and photolithography, the corresponding Y aperture element FSS was produced, and it was tested in the microwave darkroom. The calculated and measured results are in good agreement.