Tantalum pentoxide:a new material platform for high-performance dielectric metasurface optics in the ultraviolet and visible region
作者机构：School of Optical and Electronic Information&Wuhan National Laboratory for OptoelectronicsHuazhong University of Science and TechnologyWuhanHubei 430074China National Institute of Standards and TechnologyGaithersburgMD 20899USA University of MarylandCollege ParkMD 20742USA National Institute of Standards and TechnologyBoulderCO 80305USA
出 版 物：《Light(Science & Applications)》 (光（科学与应用)（英文版）)
年 卷 期：2024年第13卷第1期
页 面：142-152页
核心收录：
学科分类：08[工学] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）]
基 金：the National Institute of Standards and Technology(NIST)Physical Measurement Laboratory Award No.70NANB14H209 through the University of Maryland.O.K.was supported by an appointment to the Intelligence Community Postdoctoral Research Fellowship Program at NIST administered by Oak Ridge Institute for Science and Education(ORISE)through an interagency agreement between the U.S.Department of Energy and the Office of the Director of National Intelligence(ODNI)
主 题：dielectric optics ultraviolet
摘 要：Dielectric metasurfaces,composed of planar arrays of subwavelength dielectric structures that collectively mimic the operation of conventional bulk optical elements,have revolutionized the field of optics by their potential in constructing high-efficiency and multi-functional optoelectronic systems on *** performance of a dielectric metasurface is largely determined by its constituent material,which is highly desired to have a high refractive index,low optical loss and wide bandgap,and at the same time,be fabrication ***,we present a new material platform based on tantalum pentoxide(Ta2O5)for implementing high-performance dielectric metasurface optics over the ultraviolet and visible spectral *** wide-bandgap dielectric,exhibiting a high refractive index exceeding 2.1 and negligible extinction coefficient across a broad spectrum,can be easily deposited over large areas with good quality using straightforward physical vapor deposition,and patterned into high-aspect-ratio subwavelength nanostructures through commonly-available fluorine-gas-based reactive ion *** implement a series of highefficiency ultraviolet and visible metasurfaces with representative light-field modulation functionalities including polarization-independent high-numerical-aperture lensing,spin-selective hologram projection,and vivid structural color generation,and the devices exhibit operational efficiencies up to 80%.Our work overcomes limitations faced by scalability of commonly-employed metasurface dielectrics and their operation into the visible and ultraviolet spectral range,and provides a novel route towards realization of high-performance,robust and foundry-manufacturable metasurface optics.
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