Diamond growth in a high temperature and high pressure Fe–Ni–C–Si system:Effect of synthesis pressure
Diamond growth in a high temperature and high pressure Fe-Ni-C-Si system: Effect of synthesis pressure作者机构:State Key Laboratory of Superhard MaterialsCollege of PhysicsJilin UniversityChangchun 130012China Key Laboratory of Material Physics of Ministry of EducationSchool of Physics and MicroelectronicsZhengzhou UniversityZhengzhou 450052China
出 版 物:《Chinese Physics B》 (中国物理B(英文版))
年 卷 期:2023年第32卷第12期
页 面:602-608页
核心收录:
学科分类:081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术]
主 题:silicon-doped diamond crystal quality pressure effect nitrogen content
摘 要:Pressure is one of the necessary conditions for diamond *** the influence of pressure on growth changes in silicon-doped diamonds is of great value for the production of high-quality *** work reports the morphology,impurity content and crystal quality characteristics of silicon-doped diamond crystals synthesized under different *** transform infrared spectroscopy shows that with the increase of pressure,the nitrogen content in the C-center inside the diamond crystal decreases.X-ray photoelectron spectroscopy test results show the presence of silicon in the diamond crystals synthesized by adding silicon *** spectroscopy data shows that the increase in pressure in the Fe-Ni-C-Si system shifts the Raman peak of diamonds from 1331.18 cm^(-1)to 1331.25 cm^(-1),resulting in a decrease in internal stress in the *** half-peak width decreased from 5.41 cm^(-1)to 5.26 cm^(-1),and the crystallinity of the silicon-doped diamond crystals improved,resulting in improved *** work provides valuable data that can provide a reference for the synthesis of high-quality silicon-doped diamonds.