Contributions of holography to the advancement of interferometric measurements of surface topography
作者机构:Zygo CorporationMiddlefieldCT USA Shanghai Institute of Optics and Fine MechanicsChinese Academy of SciencesShanghaiChina University of StuttgartStuttgartGermany
出 版 物:《Light(Advanced Manufacturing)》 (光(先进制造)(英文))
年 卷 期:2022年第3卷第2期
页 面:80-99页
学科分类:1304[艺术学-美术学] 13[艺术学] 08[工学] 0804[工学-仪器科学与技术] 0802[工学-机械工程]
主 题:holography topography interferometry metrology
摘 要:Two major fields of study in optics—holography and interferometry—have developed at times independently and at other times *** two methods share the principle of holistically recording as an intensity pattern the magnitude and phase distribution of a light wave,but they can differ significantly in how these recordings are formed and *** we review seven specific developments,ranging from data acquisition to fundamental imaging theory in three dimensions,that illustrate the synergistic developments of holography and interferometry.A clear trend emerges,of increasing reliance of these two fields on a common trajectory of enhancements and improvements.