Correction of Interferometric High-Order Nonlinearity Error in Metrological Atomic Force Microscopy
作者机构：Physikalisch-Technische BundesanstaltBundesallee 10038116BraunschweigGermany Key Laboratory for Magnetism of Zhejiang ProvinceCollege of Materials and ChemistryChina Jiliang UniversityHangzhou310018People’s Republic of China
出 版 物：《Nanomanufacturing and Metrology》 (纳米制造与计量（英文）)
年 卷 期：2022年第5卷第4期
页 面：412-422页
核心收录：
学科分类：0202[经济学-应用经济学] 02[经济学]
基 金：Open Access funding enabled and organized by Projekt DEAL
主 题：Dimensional nanometrology Traceable calibration Metrological atomic force microscopy Interferometry Nonlinearity error Step height
摘 要：Metrological atomic force microscopes(***)with built-in interferometers are one of the main workhorses for versatile dimensional *** interferometric nonlinearity error,particularly the high-order(i.e.,3rd-and 4th-order)nonlinearity errors,is a dominant error source for further improving their metrology performance,which cannot be corrected using the conventional Heydemann correction *** solve this problem,two new methods were *** uses a capacitive sensor embedded in the ***,and the other applies an external physical artifact with a flat *** methods can be applied very conveniently and can effectively reduce the nonlinearity *** this paper,the propagation of the(residual)nonlinearity error in step height calibrations is ***,the performance of the improved tool is verified in the calibration of a highly demanding industrial *** the measurements performed at 25 different positions and repeated six times,the standard deviation of the total 150 measured values is 0.08 nm,which includes the contributions from the reproducibility of the metrology tool and sample *** research has significantly improved our dimensional nanometrology *** instance,the extended measurement uncertainty(k=2)is reduced from 1.0 to 0.3 nm for the step height or etching depth calibrations.
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