Hard X-ray focusing resolution and efficiency test with a thickness correction multilayer Laue lens

作     者：Shuai-Peng Yue Liang Zhou Yi-Ming Yang Hong Shi Bin Ji Ming Li Peng Liu Ru-Yu Yan Jing-Tao Zhu Guang-Cai Chang Shuai-Peng Yue;Liang Zhou;Yi-Ming Yang;Hong Shi;Bin Ji;Ming Li;Peng Liu;Ru-Yu Yan;Jing-Tao Zhu;Guang-Cai Chang

作者机构：Institute of High Energy PhysicsChinese Academy of Sciences19B Yuquan RoadBeijing 100049China University of Chinese Academy of Sciences19A Yuquan RoadBeijing 100049China School of Physics Science and EngineeringTongji University1239 Siping RoadYangpu DistrictShanghai 200092China 

出 版 物：《Nuclear Science and Techniques》 (核技术（英文）)

年 卷 期：2022年第33卷第9期

页      面：101-110页

核心收录：

学科分类：070207[理学-光学] 07[理学] 08[工学] 0803[工学-光学工程] 0702[理学-物理学] 

基　　金：the National Natural Science Foundation of China(Nos.12005250 U1932167 and U1432244) 

主　　题：Synchrotron radiation Multilayer Laue lens DC magnetron sputtering Grazing incidence X-ray reflectivity Hard X-ray nanofocusing 

摘      要：The multilayer Laue lens(MLL) is a diffractive focusing optical element which can focus hard X-rays down to the nanometer scale. In this study, a WSi_(2)/Si multilayer structure consisting of 1736 layers, with a 7.2-nm-thick outermost layer and a total thickness of 17 μm, is prepared by DC magnetron sputtering. Regarding the thin film growth rate calibration, we correct the long-term growth rate drift from 2 to 0.6%, as measured by the grazing incidence X-ray reflectivity(GIXRR). A one-dimensional line focusing resolution of 64 nm was achieved,while the diffraction efficiency was 38% of the-1 order of the MLL Shanghai Synchrotron Radiation Facility(SSRF) with the BL15U beamline.