Electrochemical Deposition of Ni-W Gradient Deposit and Its Structural Characterization

作     者：王宏智 姚素薇 张卫国 

作者机构：School of Chemical Engineering and TechnologyTianjin UniversityTianjin 300072China 

出 版 物：《Chinese Journal of Chemical Engineering》 (中国化学工程学报（英文版）)

年 卷 期：2003年第11卷第3期

页      面：348-351页

核心收录：

学科分类：081704[工学-应用化学] 07[理学] 08[工学] 0817[工学-化学工程与技术] 070302[理学-分析化学] 0703[理学-化学] 

基　　金：Supported by the National Natural Science Foundation of China (No.59671058) 

主　　题：electrochemical deposition Ni-W alloy FGM amorphous 

摘      要：The Ni-W gradient deposit with nano-structure was prepared by an electrochemical deposition method.X-ray diffraction (XRD) and energy dispersive X-ray analysis (EDXA) indicate that the crystallite size of the deposit decreases from 10.3nm to 1.5nm and the crystal grating aberrance increases with the increase of W content in the growing direction of the deposit. The structure of deposit changes from crystalline to amorphous stepwise with associated increase of crystal grating aberrance, and presents gradient distribution. These show that the deposit isgradient with nano-structure.