White light interferometry with spectral-temporal demodulation for large-range thickness measurement

作     者：Yunlong Zhu Zhuoran Li Xu Lu Yonggui Yuan Jun Yang 朱云龙;李卓然;卢旭;苑勇贵;杨军

作者机构：Key Laboratory of In-fiber Integrated OpticsMinistry of Education of ChinaHarbin Engineering UniversityHarbin 150001China College of Physics and Optoelectronic EngineeringHarbin Engineering UniversityHarbin 150001China Guangdong Provincial Key Laboratory of Information Photonics Technology(Guangdong University of Technology)Guangzhou 510006China School of Information EngineeringGuangdong University of TechnologyGuangzhou 510008China 

出 版 物：《Chinese Optics Letters》 (中国光学快报（英文版）)

年 卷 期：2022年第20卷第9期

页      面：25-30页

核心收录：

学科分类：070207[理学-光学] 07[理学] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0703[理学-化学] 0803[工学-光学工程] 0702[理学-物理学] 

基　　金：supported by the National Natural Science Foundation of China(Nos.62005062 and 61975040) the National Science Fund for Distinguished Young Scholars of China(No.61925501) the Open Fund of Guangdong Provincial Key Laboratory of Information Photonics Technology(No.GKPT20-02) 

主　　题：white light interferometry thickness measurement spectral-temporal demodulation thin film 

摘      要：Film thickness measurement can be realized using white light interferometry,but it is challenging to guarantee high precision in a large range of *** on scanning white light interferometry,we propose a spectral-temporal demodulation scheme for large-range thickness *** demodulation process remains unchanged for either coatings or substrate-free films,while some adjustments are made according to the estimated optical *** show that the single-point repeatabilities for 500 nm SiO_(2) coating and 68μm substrate-free Si film are no more than 0.70 nm and 1.22 nm,*** method can be further developed for simultaneous measurement of surface profile and film thickness.