Damage Performance of Multilayer Films under Simultaneous Exposure to Multi-Wavelength Pulses

作     者：周明 赵元安 凌秀兰 李淑红 邵建达 范正修 

作者机构：Key Laboratory of Material Science and Technology for High Power Lasers Shanghai Institute of Optics and Fine Mechanics Chinese Academy of Sciences Shanghai 201800 Graduate Universities of Chinese Academy of Sciences Beijing 100049 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：2009年第26卷第7期

页      面：136-138页

核心收录：

学科分类：081405[工学-防灾减灾工程及防护工程] 08[工学] 081402[工学-结构工程] 081304[工学-建筑技术科学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0813[工学-建筑学] 0704[理学-天文学] 0814[工学-土木工程] 

基　　金：Supported by the National Natural Science Foundation of China under Grant No 60678004 

主　　题：Optics quantum optics and lasers Nanoscale science and low-D systems Condensed matter: structural mechanical & thermal 

摘      要：Laser damage performance of multilayer films with combined irradiation of 1ω and 2ω is studied to probe the damage mechanisms during wavelength division. The laser induced damage thresholds （LIDTs） of the samples are obtained and tested with only 2ω with various energy densities of 1ω. Different 1ω; polarization directions combined with the 2ω case are also investigated. The result suggests that lw can raise the damage probability of multilayer mirrors when two light wavelengths are present simultaneously; the increasing number of sensitive defects for 2ω can be related to the decline of the LIDTs of the multilayer mirrors.