Fabrication of the beam splitters for soft X-ray laser application

作     者：WANG Zhanshan WU Yonggang TANG Weixing QIN Shuji CHEN Lingyan XU Xiangdong HONG Yilin FU Shaojun ZHU Jie CUI Mingqi 

作者机构：Institute of Precision Optical EngineeringDepartment of PhysicsTongji UniversityShanghai 200092China National Synchrotron Radiation LaboratoryUniversity of Science and Technology of ChinaHefei 230029China Institute of High Energy PhysicsBeijing 100039China 

出 版 物：《Chinese Science Bulletin》 (CHINESE SCIENCE BULLETIN)

年 卷 期：2003年第48卷第18期

页      面：1930-1933页

核心收录：

学科分类：080901[工学-物理电子学] 0809[工学-电子科学与技术（可授工学、理学学位）] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程] 

基　　金：2002AA847050 National Natural Science Foundation of China,NSFC: 60178021,69989801 

主　　题：soft X-ray beam splitter multilayer interference. 

摘      要：The soft X-ray interferometry is completed by the Mach-Zehnder interferometer using a soft X-ray laser, and it is also an important method to measure the electron densities of a laser-produced plasma near the critical surface. It is apparently demonstrated in this paper that the incident angle of each optical element in the soft X-ray Mach- Zehnder interferometer should be near normal incidence based on the polarized characteristics of the soft X-ray mul-tilayers, and the product of reflectivity and transmission of the beam splitter should be taken as a standard of design according to the structure of the soft X-ray Mach-Zehnder interferometer. The beam splitters used in the soft X-ray interferometry at 13.9 nm are fabricated using the ion beam sputtering. The figure error of the beam splitter has reached the nanometer magnitude, in which the product of reflectiv-ity and transmission of the beam splitter is more than 1.6%.