Influence of Nickel Catalyst Film Thickness and Cooling Condition for Synthesis of Monolayer Graphene by Thermal Chemical Vapor Deposition at 800 ℃
Influence of Nickel Catalyst Film Thickness and Cooling Condition for Synthesis of Monolayer Graphene by Thermal Chemical Vapor Deposition at 800 ℃作者机构：Department of Electrical Engineering Kobe City College of Technology Kobecity Hyogo 651-2194 Japan Department of Electrical and Electronic Information Engineering Toyohashi University of Technology Toyohashi City AichL441-8580 Japan Grduate School of Materials Science Nara Institute of Science and Technology Ikoma City Nara 630-0192 Japan
出 版 物：《材料科学与工程（中英文B版）》 (Journal of Materials Science and Engineering B)
年 卷 期：2015年第5卷第9期
页 面：341-346页
学科分类：081702[工学-化学工艺] 08[工学] 0817[工学-化学工程与技术] 080501[工学-材料物理与化学] 0805[工学-材料科学与工程（可授工学、理学学位）]
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