Alloys Preparation of Ag Particles/Islands on Si Wafer by RF Magnetron Sputtering

作     者：Jae-Wung Lee 

作者机构：School of Materials Science and EngineeringGeorgia Institute of TechnologyAtlantaGA 30332-0245USA 

出 版 物：《稀有金属材料与工程》 (Rare Metal Materials and Engineering)

年 卷 期：2012年第41卷第S1期

页      面：403-406页

核心收录：

学科分类：080503[工学-材料加工工程] 08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：Supported by"the Fundamental Research Funds for the Central Universities" 

主　　题：Ag nano-particles/island film sputter anneal diffuse grow 

摘      要：In order to investigate the morphology change of Ag nano-particles/island film with the sputtering time and annealing temperature,Ag nano-particles/island films were sputtered on the silicon wafers by radio-frequency(RF)magnetron *** nano-particles/islands films were sputtered on Si wafer with different *** sputtering,the samples with Ag nano-particles/islands films were annealed at 100,200 and 400 o C for 1 h,*** spectrum was employed to examine the phase stability of Ag particles/island film after annealed at 400 o C for *** result showed that the Raman spectrum peak of Ag particles/island film with annealed at 400 o C was similar to that of pure *** electron microscope(SEM)was used to test the microstructures and morphology of the films with different *** further study the morphology change,atomic force microscope(AFM)was used to test surface morphology of the Ag particles/islands *** SEM and AFM results showed that the morphology of Ag nano-particles/island films were different with the increasing sputtering *** particles went through a dramatic change on the Si wafer surface,when sputtering time changed from 3 to 60 s,Ag particles diffused and agglomerated with the annealing temperature increasing.