Simulation study of new 3-terminal devices for high speed STT-RAM
Simulation study of new 3-terminal devices for high speed STT-RAM作者机构:Institute of MicroelectronicsTsinghua University Data Storage InstituteA~*STAR
出 版 物:《Journal of Semiconductors》 (半导体学报(英文版))
年 卷 期:2011年第32卷第7期
页 面:46-48页
核心收录:
学科分类:08[工学] 081201[工学-计算机系统结构] 0812[工学-计算机科学与技术(可授工学、理学学位)]
基 金:Project supported by the National High Technology Research and Development Program of China(No.2009AA01 A403) the Foundation for Key Program of Ministry of Education,China(No.20091770305) the Fok Ying-Tong Education Foundation,China(No.114011)
主 题:spin transfer torque non-volatile memory spin valve micro-magnetic simulation
摘 要:To improve the performance of spin transfer torque random access memory(STT-RAM),especially writing speed,we propose three modified 3-terminal STT-RAM cells.A magnetic dynamic process in the new structures was investigated through micro-magnetic *** best switching speed of the new structures is 120%faster than that of the rectangular 3-terminal *** optimized 3-terminal device offers high speed while maintaining the high reliability of the 3-terminal structure.