Monolithic DWDM source with precise channel spacing
Monolithic DWDM source with precise channel spacing作者机构:James Watt School of EngineeringUniversity of GlasgowGlasgowG128QQUK
出 版 物:《Journal of Semiconductors》 (半导体学报(英文版))
年 卷 期:2021年第42卷第4期
页 面:98-103页
核心收录:
学科分类:070207[理学-光学] 080901[工学-物理电子学] 07[理学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程] 0702[理学-物理学]
主 题:lasers distributed-feedback diode laser arrays multiple quantum well(MQW)modulators semiconductor optical amplifier integrated optics devices
摘 要:We report a low-cost manufacturing approach for fabricating monolithic multi-wavelength sources for dense wavelength division multiplexing(DWDM)systems that offers high yield and eliminates crystal regrowth and selective area epitaxy steps that are essential in traditional fabrication *** source integrates an array of distributed feedback(DFB)lasers with a passive coupler and semiconductor optical amplifier(SOA).Ridge waveguide lasers with sampled Bragg side wall gratings have been integrated using quantum well intermixing to achieve a fully functional four-channel DWDM source with 0.8 nm wavelength spacing and residual errors10 mW per channel making the source suitable for use in passive optical networks(PONs).We have also investigated using multisection phase-shifted sampled gratings to both increase the effective grating coupling coefficient and precisely control the channel lasing wavelength *** 8-channel DFB laser array with 100 GHz channel spacing was demonstrated using a sampled grating with twoπ-phase-shifted sections in each sampling *** entire array was fabricated by only a single step of electron beam lithography.