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Monolithic DWDM source with precise channel spacing

Monolithic DWDM source with precise channel spacing

作     者:Lianping Hou Song Tang John H.Marsh Lianping Hou;Song Tang;John H.Marsh

作者机构:James Watt School of EngineeringUniversity of GlasgowGlasgowG128QQUK 

出 版 物:《Journal of Semiconductors》 (半导体学报(英文版))

年 卷 期:2021年第42卷第4期

页      面:98-103页

核心收录:

学科分类:070207[理学-光学] 080901[工学-物理电子学] 07[理学] 0809[工学-电子科学与技术(可授工学、理学学位)] 08[工学] 080401[工学-精密仪器及机械] 0804[工学-仪器科学与技术] 0803[工学-光学工程] 0702[理学-物理学] 

基  金:This work was supported by the U.K.Engineering and Physical Sciences Research Council(EP/R042578/1)and the National Science Foundation of China(61320106013).We would like to acknowledge the staff of the James Watt Nanofabrication Centre at the University of Glasgow for help in fabricatingthe devices 

主  题:lasers distributed-feedback diode laser arrays multiple quantum well(MQW)modulators semiconductor optical amplifier integrated optics devices 

摘      要:We report a low-cost manufacturing approach for fabricating monolithic multi-wavelength sources for dense wavelength division multiplexing(DWDM)systems that offers high yield and eliminates crystal regrowth and selective area epitaxy steps that are essential in traditional fabrication *** source integrates an array of distributed feedback(DFB)lasers with a passive coupler and semiconductor optical amplifier(SOA).Ridge waveguide lasers with sampled Bragg side wall gratings have been integrated using quantum well intermixing to achieve a fully functional four-channel DWDM source with 0.8 nm wavelength spacing and residual errors10 mW per channel making the source suitable for use in passive optical networks(PONs).We have also investigated using multisection phase-shifted sampled gratings to both increase the effective grating coupling coefficient and precisely control the channel lasing wavelength *** 8-channel DFB laser array with 100 GHz channel spacing was demonstrated using a sampled grating with twoπ-phase-shifted sections in each sampling *** entire array was fabricated by only a single step of electron beam lithography.

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