Dispersion of copper oxide supported on γ-alumina and its sulfation properties

作     者：郁青春 张世超 杨斌 YU Qing-chun;ZHANG Shi-chao;YANG Bin

作者机构：昆明理工大学冶金与能源工程学院真空冶金国家工程实验室 北京航空航天大学材料科学与工程学院 

出 版 物：《Transactions of Nonferrous Metals Society of China》 (中国有色金属学报（英文版）)

年 卷 期：2011年第21卷第12期

页      面：2644-2648页

核心收录：

学科分类：081705[工学-工业催化] 08[工学] 0817[工学-化学工程与技术] 

基　　金：Project (Jinchuan 201114) supported by the Pre-Research Foundation of Jinchuan Group Ltd., China Project (2011148) supported by the Analysis and Testing Foundation of Kunming University of Science and Technology, China 

主　　题：copper oxide dispersion submonolayer 

摘      要：CuO/γ-Al2O3 catalysts were prepared by impregnation with different CuO loadings. The dispersion of CuO supported on γ-Al2O3 support was studied using X-ray diffraction （XRD）, scanning electron microscopy （SEM）, and temperature programmed reduction （TPR）. The dispersion threshold of CuO in γ-Al2O3 determined by X-ray quantitative analysis was 0.275 g/g, i.e., 0.275CuAl. Highly dispersed CuO or crystalline CuO would appear on the γ-Al2O3 support when CuO loading was below or more than its dispersion threshold. TPR experiments show that reduction peak temperature ranges of 0.1CuAl and pure CuO are 420-690 °C and 290-380 °C, respectively. 0.1CuAl is not easily reduced due to interaction between CuO and γ-Al2O3. 0.5CuAl shows a two-step reduction range during 210-300 °C and 410-730 °C, which confirms the existence of highly dispersed CuO and crystalline CuO. The sulfation experiments show the optimal CuO loading amount is far below its dispersion threshold, and copper oxide supported on γ-Al2O3 is in the form of submonolayer.