Dynamical Analysis of Sputtering at Threshold Energy Range： Modelling of Ar＋Ni（100） Collision System

作     者：HUNDUR Yakup GUVENC Ziya B HIPPLER Rainer 

作者机构：Department of Physics Istanbul Technical University Istanbul TR-34469 Turkey Electronic and Communication Engineering Cankaya University Balgat Ankara TR-06530 Turkey Institut für Physik Ernst-Moritz-Arndt Universitate Greifswald Greifswald D-17489 Germany 

出 版 物：《Chinese Physics Letters》 (中国物理快报（英文版）)

年 卷 期：2008年第25卷第2期

页      面：730-733页

核心收录：

学科分类：07[理学] 0805[工学-材料科学与工程（可授工学、理学学位）] 0704[理学-天文学] 070202[理学-粒子物理与原子核物理] 0702[理学-物理学] 

基　　金：the Istanbul Technical University under the Young Researchers Scholarship 

主　　题：SURFACE YIELD 

摘      要：The sputtering process of Ar＋Ni（100） collision systems is investigated by means of constant energy molecular dynamics simulations. The Ni（100） slab is mimicked by an embedded-atom potential, and the interaction between the projectile and the surface is modelled by using the reparametrized ZBL potential. Ni atom emission from the lattice is analysed over the range of 20-50 eV collision energy. Sputtering yield, angular and energy distributions of the scattered Ar and of the sputtered Ni atoms are calculated, and compared to the available theoretical and experimental data.