Microstructure Control of Nanoporous Silica Thin Film Prepared by Sol-gel Process

作     者：Yiqun XIAO Jun SHEN Zhiyong XIE Bin ZHOU Guangming WU 

作者机构：Pohl Institute of Solid State Physics Tongji University Shanghai 200092 China 

出 版 物：《Journal of Materials Science & Technology》 (材料科学技术（英文版）)

年 卷 期：2007年第23卷第4期

页      面：504-508页

核心收录：

学科分类：08[工学] 0805[工学-材料科学与工程（可授工学、理学学位）] 

基　　金：the National Natural Science Foundation of China(Grant No.20133040) the Chinese National Foundation of High Technology(2002AA842052) the Shanghai Nanotechnology Promotion Center(0352nm022,0352nm056) the Shanghai International Cooperation Program and Trans-Century Training Programme Foundation for the Talents by the State Education Commission 

主　　题：Sol-gel Nanoporous Microstructure Optical constants Silica Thin Film 

摘      要：Nanoporous silica films were prepared by sol-gel process with base, acid and base/acid two-step *** electron microscope （TEM） and particle size analyzer were used to characterize the microstructure and the particle size distribution of the sols. Scanning electron microscopy （SEM）, atomic force microscopy （AFM） and spectroscopic ellipsometer were used to characterize the surface microstructure and the optical properties of the silica films. Stability of the sols during long-term storage was investigated. Moreover,the dispersion relation of the optical constants of the silica films, and the control of the microstructure and properties of the films by changing the catalysis conditions during sol-gel process were also discussed.